NUREMBURG, Germany — Engineers at Carl Zeiss SMT AG and the Sematech consortium have announced a method of photomask registration and overlay suitable for double patterning lithography. The method, ...
Litho-etch-litho-etch (LELE) is the double patterning (DP) technology of choice for 20 nm contact, via, and lower metal layers. We discuss the unique design and process characteristics of LELE DP, the ...
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