In semiconductor manufacturing, lithography is a critical process that uses light to transfer intricate circuit (IC) patterns onto a silicon wafer. This process enables the creation of tiny ...

The ability to create intricate, nano-scale patterns is at the heart of nanotechnology, and lithography techniques are the tools that make this possible. From photolithography to FIB, each technique ...

MELVILLE, N.Y., April 8, 2021 /PRNewswire/ -- Canon U.S.A., Inc., a leader in digital imaging solutions, today announced that its parent company, Canon Inc., has launched the FPA-5520iV LF Option for ...

Nanostencil lithography (NSL) is a shadow-mask-based nanopatterning technique that allows for the direct deposition of materials through a stencil mask with nanoscale openings. It enables the ...

Imagine a machine so advanced it operates with light invisible to the human eye, etching circuits onto silicon wafers at scales smaller than a virus. This is the world of EUV lithography, a ...

Canon has developed a new approach to lithography that reduces costs and energy consumption compared to ASML's EUV systems. Canon's new nanoimprint lithography machine imprints circuit patterns "like ...

The resolution (or minimum feature) of optical systems is well known to the microlithography community as the Rayleigh criteria. It is so well known within this community that it is rarely mentioned ...