This paper presents a new method, design for inspection (DFI) to characterize overlay. Using design-assisted voltage contrast measurement, the method enables in-line test and monitoring of process ...

Overlay is one of the most critical process control steps of semiconductor manufacturing technology. A typical advanced scheme includes an overlay feedback loop based on after litho optical imaging ...

Apple has filed for a patent (number 20220121358) for a “device, method, and graphical user interface for displaying user interfaces and user device overlay elements.” In the patent filing, Apple ...