“Top-down” diamond patterning methods, such as reactive ion etching, are difficult given the material’s chemical inertness.
A new organic material holds its shape under light and solvents, allowing engineers to build flexible, reliable electronics and light-sensitive devices without complex processing steps. (Nanowerk ...
FUJIFILM Corporation will present the company’s latest research findings at SPIE Advanced Lithography + Patterning 2026 (SPIE 2026), taking place February 22-26, 2026, in San Jose, California. The ...
Figure 1. A systematic diagram from material dimensions and patterning processes to device applications. Perovskite structure. Major patterning methods, including template-confined growth, inkjet ...
Unoh Kwon, vice president at high performance memory maker SK hynix, talks on stage at the opening plenary session at the ...
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